Government Contract | Missouri
High Resolution Electron Beam Lithography System

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Bid Information

Bid Alert No: 00000424142

Bid Title: High Resolution Electron Beam Lithography System

Agency Bid No. Title: 16 8012 KS R

Received Date: 11/24/2015

Close Date: 12/16/2015

Purchase Type: Term:

Delivery Point: University of Missouri, Missouri

Delivery Date: Not Stated

Special Notices: Minority Business Set-Aside, Women-Owned Business Set-Aside, Performance Bond Required:


Specifications include, but are not limited to:A) Electron column and optics: a. Schottky thermal field emitter electron gun with a lifetime of at least one 5000 hrs b. Electron beam energy range: 20 V to 30 kV in 10 V steps. c. Electron beam current: selectable between approximately 5 pA 20 nA d. Electron beam size: 1.6 nm at 20 kV at ~3 mm working distance, 4 nm at 1 kV at ~3 mm working distance e. Off-axis Everhart-Thornley secondary electron detector in specimen chamber and in-lens annular scintillator secondary electron detector. f. Ion getter pump on electron gun for continuously maintaining ultra-high vacuum in gun region secured by a pneumatic gun isolation valve. g. The base pressure in the gun region is better than 1 x 10 -8 mbar B) Scan Generation for Lithography: a. Real time, high speed digital pattern generator with digital signal processor of 400 MHz and 1MByte static cache memory. b. Digital analog converter: i. 16 bit resolution for X and Y directions. ii. 25 MHz bandwidth with additional deglitch circuits thermally controlled and shielded against high frequency noise. c. Minimum step size increment 0.1 nm. d. Dwell time: minimum = 50 nsec, maximum = 8 sec, in 1 nsec increments e. Writing speed: 0.125 Hz to 20 MHz pixel frequency in area mode.C) SEM Imaging and Display a. Raster scan with optional line-by-line or frame averaging, reduced raster, adjustable in size and position. b. Spot mode: Freely defined in X and Y. c. Scan rotation: up to 360scan rotation at all scan rates. d. Pixel resolution of images: continuously variable up to 4000 x 4000. D) Sample/Substrate positioning stage a. Laser interferometer position sensing in X and Y with precision L-shaped reference mirror. b. 3-axes X-Y-Z high vacuum stage. c. 100 mm travel in X and Y. d. 30 mm travel in Z without losing laser interferometer control. e. DC motors directly mounted on drive spindles for X-, Y-, and Z-axes. X- and Y- axes equipped with piezos for fine adjustment. f. Coarse motion with DC tacho motors to within ~0.2 m of destination position followed by integrated fine movement with piezo elements, both operating in closed loop with interferometric position sensing. g. 8 m piezo fine shift range. h. 1 nm positioning resolution. i. 50 kHz update frequency. j. Tilt angle -2to 92, rotation continuously. E) Specimen chamber a. Built-in infrared camera system with optics for visual control and orientation purposes b. Flanges/ports available for EDS, gas injectors, mass spectrometer, optical microscope, up to four nano-manipulators, and 5 coax electrical feed-throughs. c. Vacuum: Dry vacuum pre-pump in combination with 240 l/s turbomolecular pump, the base pressure in the specimen chamber is better than 2 10 -6 mbar.

Bid Related Documents

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Product Codes: 05050, 70055, 70056

Agency Information

Issuing Agency: University of Missouri

State: Missouri

Agency Type: State and Local

Contact: Kevin Summers, Procurement Services 1100 Carrie Francke Drive, Columbia, Missouri, 65211

Phone: 573-884-8797




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